• Lead the formulation and process development of CMP slurries and pCMP cleaning chemistries for advanced semiconductor applications.
• Define technical strategy, test plans, decision criteria, and development pathways for complex projects with significant technical ambiguity.
• Establish structure-property-performance relationships involving abrasive particles, oxidizers, inhibitors, complexing agents, polymers, surfactants, dispersants, and cleaning additives.
• Develop mechanistic understanding of material removal, selectivity, defectivity, corrosion, residue removal, particle contamination, surface condition, and formulation stability.
• Design and direct statistically robust experiments, including DOE and multivariate analysis, and integrate wafer, coupon, analytical, and formulation data to guide development decisions.
• Lead troubleshooting and root-cause analysis for complex slurry, cleaning, process, equipment, scale-up, and customer-performance issues.